发明名称 |
Lithographic apparatus and method for manufacturing a device |
摘要 |
A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
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申请公布号 |
US7542127(B2) |
申请公布日期 |
2009.06.02 |
申请号 |
US20050312660 |
申请日期 |
2005.12.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SENGERS TIMOTHEUS FRANCISCUS;VAN ASTEN NICOLAAS ANTONIUS ALLEGONDUS JOHANNES;BOX WILHELMUS JOSEPHUS;VAN EMPEL TJARKO ADRIAAN RUDOLF;LEVASIER LEON MARTIN;LOOPSTRA ERIK ROELOF;MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS;OUWEHAND LUBERTHUS;VAN DEN SCHOOR LEON JOSEPH MARIE;BECKERS MARCEL;JANSEN ROB;VAN LOENHOUT ELKE |
分类号 |
G03B27/52;G03B27/54 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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