发明名称 NOZZLE UNIT AND EQUIPMENT FOR ATOMIC LAYER DEPOSITION HAVING THE UNIT
摘要 A nozzle unit and an equipment for depositing an atomic layer having the same are provided to maintain temperature of a nozzle as the preset temperature of a protecting pipe by emitting radiant heat, provided through the protecting pipe to the nozzle, to outside. A nozzle unit(300) comprises: a nozzle(310) supplying the gas to a substrate; and a heat emitting member(320) being installed in order to cover the nozzle and absorbing radiant heat provided to the nozzle and releasing heat to prevent the nozzle from being heated due to the radiant heat. The heat emitting member comprises: a protecting pipe(322) equipped with a space for accepting the nozzle; and a radiating part(330) releasing the heat of the protecting pipe. The protecting pipe comprises a heat pipe equipped with an opening(324) to provide gas emitted from the nozzle to the substrate. The radiating part comprises: a radiation block(332) equipped with a plurality of heat radiation fins(334); and a radiation fan(336) installed at the radiation block. The heat emitting member comprises a cooling water supply part(340) supplying the cooling water to the radiating part.
申请公布号 KR20090055346(A) 申请公布日期 2009.06.02
申请号 KR20070122222 申请日期 2007.11.28
申请人 KOOKJE (KOKUSAI) ELECTRIC KOREA CO., LTD. 发明人 PARK, YONG SUNG;KIM, KI HOON
分类号 C23C16/455;C23C16/00;H01L21/20 主分类号 C23C16/455
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