| 摘要 |
A semiconductor wafer for correcting a light source and a manufacturing method thereof are provided to improve accuracy of a check or a measuring data of a semiconductor device by easily correcting a spot size corresponding to a focus part of a beam generated in a light source. A semiconductor wafer(100) for correcting a light source includes a plurality of focus correction grooves(112) formed on a surface in order to form a spot size of a beam generated in a light source while checking or measuring a surface of a semiconductor wafer. The focus correction grooves comprise a plurality of patterns formed on an oxide film deposited on the surface of the wafer. The focus correction grooves formed on the surface of the wafer have the same interval. The focus correction grooves are formed into a circular shape.
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