发明名称 NON-VOLATILE MEMORY DEVICE, AND MEMORY CARD AND SYSTEM INCLUDING THE SAME
摘要 A flash memory device, a card and a system including the same are provided to change an energy level of a valence band and a conduction band by including a nitrogen atom in a tunneling insulation layer. A substrate(10) includes a source region, a drain region, and a channel region which is positioned between the source region and the drain region. A tunneling insulation layer(20) is formed on the channel region of the substrate. The tunneling insulation layer includes a first region and a second region. The first region has a first nitrogen atomic percent. The second region has a second nitrogen atomic percent lower than the first nitrogen atomic percent. A charge storage layer(30) is formed on the tunneling insulation layer. A blocking insulation layer(40) is formed on the charge storage layer. A gate electrode(50) is formed on the blocking insulation layer.
申请公布号 KR20090055202(A) 申请公布日期 2009.06.02
申请号 KR20070121998 申请日期 2007.11.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, CHUL SUNG;CHOI, SI YOUNG;KOO, BON YOUNG;HWANG, KI HYUN;NOH, YOUNG JIN
分类号 H01L21/8247 主分类号 H01L21/8247
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