发明名称 |
NON-VOLATILE MEMORY DEVICE, AND MEMORY CARD AND SYSTEM INCLUDING THE SAME |
摘要 |
A flash memory device, a card and a system including the same are provided to change an energy level of a valence band and a conduction band by including a nitrogen atom in a tunneling insulation layer. A substrate(10) includes a source region, a drain region, and a channel region which is positioned between the source region and the drain region. A tunneling insulation layer(20) is formed on the channel region of the substrate. The tunneling insulation layer includes a first region and a second region. The first region has a first nitrogen atomic percent. The second region has a second nitrogen atomic percent lower than the first nitrogen atomic percent. A charge storage layer(30) is formed on the tunneling insulation layer. A blocking insulation layer(40) is formed on the charge storage layer. A gate electrode(50) is formed on the blocking insulation layer.
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申请公布号 |
KR20090055202(A) |
申请公布日期 |
2009.06.02 |
申请号 |
KR20070121998 |
申请日期 |
2007.11.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, CHUL SUNG;CHOI, SI YOUNG;KOO, BON YOUNG;HWANG, KI HYUN;NOH, YOUNG JIN |
分类号 |
H01L21/8247 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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