发明名称 |
NOZZLE UNIT AND EQUIPMENT FOR ATOMIC LAYER DEPOSITION HAVING THE UNIT |
摘要 |
A nozzle unit and an atomic layer deposition apparatus having the same are provided to prevent temperature rising of an external pipe by rapidly emitting a radiant heat provided to an internal pipe through an external pipe to outside. An internal pipe(310) has a firs path in which a process gas is supplied. An external pipe(320) surrounds the internal pipe in order to prevent temperature rising of the process gas supplied to the first path. A spray pipe penetrates the external pipe, and is connected to the first path of the internal pipe. The spray pipe sprays the process gas supplied to the first path of the internal pipe. The external pipe has a second path in which a cooling gas for cooling the internal pipe is supplied. The external pipe has horizontal ribs in order to flow the cooling gas toward zigzag in the second path.
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申请公布号 |
KR20090055347(A) |
申请公布日期 |
2009.06.02 |
申请号 |
KR20070122223 |
申请日期 |
2007.11.28 |
申请人 |
KOOKJE (KOKUSAI) ELECTRIC KOREA CO., LTD. |
发明人 |
PARK, YONG SUNG;KIM, KI HOON |
分类号 |
H01L21/02;H01L21/20 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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