发明名称 Stage and X-Y stage each on which to place sample, and charged-particle beam apparatus
摘要 Provided is a stage on which to place a sample, which is capable of performing a high-precision positioning at a short time, and which prevents an image drift of a measuring object. The stage includes: a base having a guiding unit; a table which moves in a movement direction along the guiding unit; a motion unit which provides motion in the movement direction in order to cause the table to move; and a transmission unit for transmitting the motion to the table. In the stage, the transmission unit includes a table block fixed to the table, and a motion block fixed to the motion unit; and the table block and the motion block contact each other at two points forward and backward in the movement direction while in motion, and are separated away from each other while not in motion.
申请公布号 US7541719(B2) 申请公布日期 2009.06.02
申请号 US20070754482 申请日期 2007.05.29
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 FUJITA MASASHI;NAKAGAWA SHUICHI
分类号 H01L41/08 主分类号 H01L41/08
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