| 摘要 |
A photosensitive resin composition for an interlayer insulation film is provided to increase the insulation of an interlayer insulating film by using a specific structure of an alkali soluble resin component. A photosensitive resin composition for an interlayer insulation film comprises an alkali soluble resin component; a sensitizer; and a copolymer containing an acidic group-containing component, a crosslinking group-containing component and an alkoxysilyl group-containing component. The alkoxysilyl group-containing component is represented by chemical formula 1. In chemical formula 1, R4 is hydrogen atom or methyl; R5 is C1-5 alkylene group; R6, R7 and R8 which are identical or different represent C1-5 alkoxy or alkyl group; and at least one of R6, R7 and R8 is an alkoxy group. |
