发明名称 Coating solution for forming high dielectric constant thin film and method for forming dielectric thin film using the same
摘要 Disclosed herein are a coating solution for the formation of a dielectric thin film and a method for the formation of a dielectric thin film using the coating solution. The coating solution comprises a titanium alkoxide, a beta-diketone or its derivative, and a benzoic acid derivative having an electron donating group. The method comprises spin coating the coating solution on a substrate to form a thin film and drying the thin film at a low temperature to crystallize the thin film. The titanium-containing coating solution is highly stable. In addition, the coating solution enables formation of a thin film, regardless of the kind of substrates, and can be used to form dielectric thin films in an in-line mode in the production processes of PCBs.
申请公布号 US7540913(B2) 申请公布日期 2009.06.02
申请号 US20060541673 申请日期 2006.10.03
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 BAE JUN HEE;KIM SEUNG HYUN;CHUNG YUL KYO;SONG WON HOON;LIM SUNG TAEK;JIN HYUN JU
分类号 C09D185/00 主分类号 C09D185/00
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