| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus improving cleaning efficiency. SOLUTION: The substrate processing apparatus includes a jet nozzle which injects processing liquid and dries a substrate. The jet nozzle emits processing liquid onto the substrate and also injects processing gas toward the processing liquid emitted from the jet nozzle while adjusting flow of the processing gas. Therefore, the substrate processing apparatus achieves the minimum droplet of the processing liquid, thereby improving cleaning efficiency and product yield. COPYRIGHT: (C)2009,JPO&INPIT
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