| 摘要 |
Disclosed herein is a magnetized, inductively coupled plasma processing apparatus and plasma generation method. The inductively coupled plasma processing apparatus according to an embodiment of the present invention includes a vacuum chamber (200). A sample seating means (205) is provided in the vacuum chamber. An antenna (210) is configured to generate plasma in the vacuum chamber. At least one pair of permanent magnets (230, 235) are arranged above the antenna and below the sample seating means (205) and are configured to generate a magnetic field in a vertical direction of the vacuum chamber and to have opposite polarities on the facing ends.
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