| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflective film which is high in the hardness of the outermost surface, is excellent in wear resistance and is low in reflectance, to provide a light-transmissive member and to provide a method of forming the antireflective film. <P>SOLUTION: The antireflective film is formed on the surface of a member capable of transmitting visible light, and a film constituting the outermost surface of the antireflective film is Si-Al<SB>2</SB>O<SB>3</SB>film or F-Al<SB>2</SB>O<SB>3</SB>film as Al<SB>2</SB>O<SB>3</SB>to which Si or F is added. The method of forming antireflective film for forming the antireflective film on the surface of the member which transmits visible light includes an outermost surface forming process for forming Si-Al<SB>2</SB>O<SB>3</SB>film or F-Al<SB>2</SB>O<SB>3</SB>film as Al<SB>2</SB>O<SB>3</SB>to which Si or F is added, as the film constituting the outermost surface of the antireflective film and, in the outermost surface forming process, the Si-Al<SB>2</SB>O<SB>3</SB>film or F-Al<SB>2</SB>O<SB>3</SB>film is formed by an ECR plasma sputtering device using ECR plasma exciting method. <P>COPYRIGHT: (C)2009,JPO&INPIT |
