| 摘要 |
<p>[PROBLEMS] To provide a D/V converter exhibiting a high resolution and having a good linearity with respect to digital values and an electron beam lithography system equipped with such a D/A converter. [MEANS FOR SOLVING PROBLEMS] A D/A converter (30) comprises a D/A conversion basic unit (35) composed of a first D/A converting section for D/A conversion of high-order bits and a second D/A converting section for D/A conversion of low-order bits and having an auxiliary bit with the same weight as that of the least significant bit, a correction D/A converting unit (38), an error detecting unit (33) for generating a digital code to be set in a D/A converter of the correction D/A converting unit (38), and a control unit (34). The control unit (34) compares a first bit current source with a second bit current source at a level lower than that of the first bit current source, allows the error detecting unit (33) to generate a digital code to be set in the D/A converter of the correction D/A converting unit (38) if the control unit (34) judges that the value of the bit current source has varied, and corrects the value of the bit current source.</p> |
