| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pressure-sensitive adhesive tape for high-resolution photomask protection which is excellent in re-peelability (properties of leaving no paste on adherend after peeling), and avoids entry of bubbles even when the pressure-sensitive adhesive tape is stuck on a photomask with a complex pattern having fine dots and thin lines arranged at narrow intervals. <P>SOLUTION: The pressure-sensitive adhesive tape for photomask protection is obtained by disposing, on one surface of a transparent base material (A), a pressure-sensitive adhesive layer (B) comprising a pressure-sensitive adhesive containing an acrylic ester-based resin of which the weight average molecular weight measured as molecular weight in terms of polystyrene by GPC is 1,000,000-2,000,000 and a crosslinking agent, wherein the acrylic ester-based resin is a specific resin and an amount of tensile shear displacement of the pressure-sensitive adhesive layer (B) is 8-25μm. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
