发明名称 GAS LASER DEVICE EQUIPPED WITH FLOW CONTROL VALVE IN GAS FLOW PATH
摘要 PROBLEM TO BE SOLVED: To provide a laser gas device capable of making the temperature of laser gas quickly approach a desired value, even if cooling water is at a low temperature. SOLUTION: A gas flow path 20 is provided with gas detour paths 25a and 25b, detouring respectively a first heat exchanger 10a and a second heat exchanger 10b. Gas flow control valves 40a and 40b are respectively provided on the gas detour paths. Since the gas that has traveled via the gas detour paths 25a and 25b is not subjected to heat exchange, the temperature of the gas entering a discharge tube 3 rises, according to the open degree of the flow control valves 40a and 40b. A control part 80, based on the information of a gas-temperature measuring instrument 41, opens/closes the gas flow control valves 40a and 40b so that the laser gas that enters the discharge tube 3 reaches optimal temperature. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009117700(A) 申请公布日期 2009.05.28
申请号 JP20070290716 申请日期 2007.11.08
申请人 FANUC LTD 发明人 MURAKAMI TAKAFUMI;NISHIO AKIHIKO
分类号 H01S3/03;H01S3/036 主分类号 H01S3/03
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