| 摘要 |
An exposure apparatus includes an illumination optical system configured to illuminate an original by a luminous flux from a light source and a projection optical system configured to project a pattern of the original onto a substrate. The illumination optical system includes a generator configured to form an effective light source as a light intensity distribution on a surface that has a Fourier transformation relationship with the original and an exposure dose adjuster arranged closer to the light source than the generator and configured to control an exposure dose on an exposure surface. The exposure dose adjuster includes a transmittance adjuster configured to discretely adjust a transmittance of the luminous flux, a zoom optical system configured to adjust a diameter of the luminous flux, and an aperture having a predetermined aperture area that defines a diameter of the luminous flux that has been adjusted by the zoom optical system.
|
