ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide illumination optical system which materializes a variety of illumination conditions and improves productivity of a device when the illumination optical system is applied to an exposure apparatus.

SOLUTION: The illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source (1) has a first optical path in which a diffractive optical element (6) can be arranged at a first position thereof; a second optical path in which a spatial light modulator (3) with a plurality of optical elements (3a) arrayed two-dimensionally and controlled individually can be arranged at a second position thereof; and a third optical path which is an optical path of light having passed via at least one of the first optical path and the second optical path and in which a distribution forming optical system (11) is arranged. The distribution forming optical system (11) forms a predetermined light intensity distribution on an illumination pupil located in the third optical path, based on the light having passed via at least one of the first and second optical paths.

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