发明名称 |
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination optical system that saves space in an optical path between a spatial light modulator and an optical integrator and obtains illumination conditions of great variety. <P>SOLUTION: The illumination optical system irradiates a surface M to be irradiated with light from a light source LS. The illuminator optical system includes: the spatial light modulator 2 having a plurality of optical elements 2a arranged two-dimensionally and controlled individually; and the optical integrator 4 arranged in an optical path between the spatial light modulator and the surface to be irradiated. No optical members essentially having power are arranged in an optical path between the spatial light modulator and the optical integrator. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009117672(A) |
申请公布日期 |
2009.05.28 |
申请号 |
JP20070290235 |
申请日期 |
2007.11.08 |
申请人 |
NIKON CORP |
发明人 |
MURAMATSU KOJI |
分类号 |
H01L21/027;G02B19/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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