发明名称 |
CLUSTER TYPE SEMICONDUCTOR PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a cluster semiconductor processing apparatus of which throughput is increased, footprint is reduced and maintenance performance is improved. SOLUTION: A cluster semiconductor processing apparatus includes wafer handling chambers 5 and 6 having a polygonal base including multiple sides for wafer processing chambers and two adjacent sides for wafer loading/unloading chambers as viewed in a direction of an axis of the wafer handling chambers 5 and 6. An angle A between two adjacent sides of the multiple sides for wafer processing chambers is greater than an angle B which is calculated by dividing 360°by the number of the total sides consisting of the multiple sides for wafer processing chambers and the two adjacent sides for wafer loading/unloading chambers. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009117790(A) |
申请公布日期 |
2009.05.28 |
申请号 |
JP20080028143 |
申请日期 |
2008.02.07 |
申请人 |
ASM JAPAN KK |
发明人 |
TAKIZAWA MASAHIRO;SUWADA MASAE;HAGINO TAKASHI |
分类号 |
H01L21/02;C23C16/50;H01L21/205 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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