发明名称 CLUSTER TYPE SEMICONDUCTOR PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a cluster semiconductor processing apparatus of which throughput is increased, footprint is reduced and maintenance performance is improved. SOLUTION: A cluster semiconductor processing apparatus includes wafer handling chambers 5 and 6 having a polygonal base including multiple sides for wafer processing chambers and two adjacent sides for wafer loading/unloading chambers as viewed in a direction of an axis of the wafer handling chambers 5 and 6. An angle A between two adjacent sides of the multiple sides for wafer processing chambers is greater than an angle B which is calculated by dividing 360°by the number of the total sides consisting of the multiple sides for wafer processing chambers and the two adjacent sides for wafer loading/unloading chambers. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009117790(A) 申请公布日期 2009.05.28
申请号 JP20080028143 申请日期 2008.02.07
申请人 ASM JAPAN KK 发明人 TAKIZAWA MASAHIRO;SUWADA MASAE;HAGINO TAKASHI
分类号 H01L21/02;C23C16/50;H01L21/205 主分类号 H01L21/02
代理机构 代理人
主权项
地址