FILM FORMING DEVICE, AND SUBSTRATE TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film forming device enabling to efficiently clean the inside of a treatment container where a film is formed with epitaxial growth, and to provide a substrate treatment method enabling to efficiently clean extra deposit due to the film formation by the epitaxial growth. SOLUTION: In the film forming device, material gas as a film forming material is supplied into the treatment container having a holding plate in an internal pressure reducing space for holding a treated substrate, and induction heating of the treating substrate with a coil forms a film on the treating substrate by the epitaxial growth, then cleaning gas is supplied into the treatment container and the cleaning gas is-plasma excited to clean the inside of the treatment container. COPYRIGHT: (C)2009,JPO&INPIT