发明名称 SURFACE PROCESSING METHOD
摘要 The invention shows a method of producing high-quality ablation plume by processing a target, on a target body, with a pulsed laser beam radiation, so that the method comprises: selecting a spot area for a beam cross-section on the target to correspond the ablation threshold of the target material to being exceeded throughout the spot area of which the plume is ablated by the pulsed beam radiation within a controlled ablation depth so providing the fine quality plasma, to be used for coating and/or particle synthesis.
申请公布号 WO2009066011(A2) 申请公布日期 2009.05.28
申请号 WO2008FI50677 申请日期 2008.11.21
申请人 PICODEON LTD OY;MYLLYMAEKI, VESA;LAPPALAINEN, REIJO 发明人 MYLLYMAEKI, VESA;LAPPALAINEN, REIJO
分类号 C23C14/28;C23C14/54 主分类号 C23C14/28
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