| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wavelength plate using photonic crystal which has an improved manufacturing yield while making the best use of features of high design flexibility and excellent heat resistance and light resistance. <P>SOLUTION: A method of manufacturing the wavelength plate using photonic crystal includes the following the steps: a step (S1) of manufacturing a periodical rugged structure of rectangular shape or V shape on a transparent substrate; a step (S2) of manufacturing a photonic crystal of a multilayer film 4 by alternately forming films of the same shape as the periodical rugged structure while combining sputtering and plasm etching by using Si and Ta target, on the transparent substrate; a step (S3) of measuring a retardation of the manufactured photonic liquid crystal wavelength plate and determining whether adjustment is necessary; a step (S4) of measuring a rotation angle on a rotation stage on the basis of an oriental flat on the photonic liquid crystal wavelength plate to determine a reference adjustment value Δθc, when the adjustment is necessary (Yes in S3); and a step (S5) of using the corrected value as the reference adjustment value with respect to the reference of an assembled optical system and cutting out a photonic crystal wavelength plate by rotative adjustment to obtain the wavelength plate of high-accuracy retardation. Thereby, the manufacturing yield can be improved. <P>COPYRIGHT: (C)2009,JPO&INPIT |
