| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and a device for repairing a photomask with a pellicle for removing a growing foreign matter present on the photomask with a pellicle without peeling the pellicle. <P>SOLUTION: A gaseous mixture of activated gas and inert gas is supplied by a gas mixing machine 5 to the inner space and the outer space of a photomask 1 with a pellicle, which is housed in a chamber 2 to thereby allow a foreign matter on the photomask 1 with a pellicle to react and dissolve. Further, the photomask 1 with a pellicle and the activated gas are irradiated with light at a low wavelength by a light irradiation device 3 to enhance the reactivity of the foreign matter; and the foreign matter on the photomask 1 with a pellicle is removed by the gas flow of the gaseous mixture. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
