发明名称 PLASMA MELTING DEVICE AND METHOD, AND CRUCIBLE
摘要 PROBLEM TO BE SOLVED: To solve problems that a yield rate is lowered as fly loss is large in charging a powered material in melting the powdered material such as powder silicon by a plasma torch, and silicon is evaporated by high temperature at an arc fire point in a DC arc method. SOLUTION: A plasma melting device has a bottomed cylindrical crucible having an opening at its top portion and receiving a melted object inside, and the plasma torch composed of an electrode and a nozzle surrounding the electrode. At least a peripheral edge region of the opening is composed of a conductive material, plasma in an energizing state is produced between the electrode and the region when the voltage is applied between the electrode of the plasma torch and the peripheral edge region of the opening, and the plasma torch and the crucible are so disposed that at least one of the plasma in a non-energizing state and a gas after disappearance of plasma in the non-energizing state is put into the crucible. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009115326(A) 申请公布日期 2009.05.28
申请号 JP20070285326 申请日期 2007.11.01
申请人 SHARP CORP 发明人 FUJITA KENJI;HOJO YOSHIYUKI;KAJIMOTO KIMIHIKO
分类号 F27D11/08;C01B33/02;F27B14/14;F27B14/16;F27B14/18 主分类号 F27D11/08
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