发明名称 PROCESSING APPARATUS, METHOD FOR CLEANING THE SAME, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method for removing impurity metals, especially copper, from the surface of a quartz-made component member of a processing apparatus, by using an oxidizing gas and a reducing gas, without causing significant increase in the equipment cost. SOLUTION: The processing apparatus executes prescribed processing on a processing object, while having a processing container 4 which can be evacuated, a support means 6 for supporting the processing object in the processing container, a heating means 24 for heating the processing object, and a gas supply means 28 for supplying a prescribed gas into the processing container. The processing apparatus is configured so that at least one of the respective component members is made of quartz. Here, the quartz-made component member is cleaned, by supplying an oxidizing gas and a reducing gas into the processing container and making both the gases react with each other. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009117865(A) 申请公布日期 2009.05.28
申请号 JP20090023809 申请日期 2009.02.04
申请人 TOKYO ELECTRON LTD 发明人 TOMITA MASAHIKO;UMEZAWA KOTA;SON AKIRA;NISHIMURA TOSHIHARU
分类号 H01L21/31;C23C16/44;H01L21/22 主分类号 H01L21/31
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