发明名称 CLEANING LIQUID AND METHOD FOR MANUFACTURING ORGANIC EL APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning apparatus capable of easily removing organic compounds adhered to a vapor deposition mask for a low molecular organic EL apparatus. SOLUTION: The apparatus 1 that cleans the organic compounds adhered to the vapor deposition mask for the low molecular organic EL apparatus including a first stage 10 that treats the vapor deposition mask 140 with a derivative of pyrrolidone, a second stage 20 that treats the mask 140 with water rinse, a third stage 30 that treats the mask 140 with running water rinse, a fourth stage 40 that treats the vapor deposition mask 140 with ethanol a fifth stage 50 that dries the mask 140, and carrying means 5 that sequentially carries the mask 140 to each stage is provided. It is desirable that N-methyl-2-pyrrolidone is adopted as the derivative of pyrrolidone. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009113043(A) 申请公布日期 2009.05.28
申请号 JP20090044682 申请日期 2009.02.26
申请人 SEIKO EPSON CORP 发明人 HOSODA TOSHIKO;YOTSUYA SHINICHI
分类号 B08B3/08;B08B3/12 主分类号 B08B3/08
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