| 摘要 |
A low-index silica coating may be made by forming silica sol comprising a silane and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured and/or fired using temperature(s) of from about 550 to 700° C. A capping layer composition comprising an antifog composition including a siloxane and/or hydrofluororether may be formed, deposited on the coating layer, then cured and/or fired to form a capping layer The capping layer improves the durability of the coating. The low-index silica based coating may be used as an antireflective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) or any other suitable application in certain example instances.
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