发明名称 |
METHOD OF FABRICATING METAL INTERCONNECTION AND METHOD OF FABRICATING IMAGE SENSOR USING THE SAME |
摘要 |
A method of fabricating a metal interconnection and a method of fabricating image sensor using the same are provided. The method of fabricating a metal interconnection including forming a interlayer dielectric layer on a substrate, forming an interconnection formation region in the interlayer dielectric layer, performing an ultraviolet (UV) treatment on the substrate after the interconnection formation region is formed and forming a metal interconnection in the interconnection formation region.
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申请公布号 |
US2009137111(A1) |
申请公布日期 |
2009.05.28 |
申请号 |
US20080274040 |
申请日期 |
2008.11.19 |
申请人 |
LEE JEONG-HO;PARK YONNG-HOON;JUNG SANG-II;YANG JUN-SEOK;SHIN AN-CHUL;JUNG MIN-YOUNG |
发明人 |
LEE JEONG-HO;PARK YONNG-HOON;JUNG SANG-II;YANG JUN-SEOK;SHIN AN-CHUL;JUNG MIN-YOUNG |
分类号 |
H01L21/3205 |
主分类号 |
H01L21/3205 |
代理机构 |
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