OVERLAY MEASUREMENT ON DOUBLE PATTERNING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To improve the reliability of the calculation of a double patterning overlay error.

SOLUTION: The method measures overlay between a first structure and a second structure. The structure is provided with equidistant elements such as parallel lines, wherein the equidistant elements of the first structure and the second structure alternate. The design width CD1of the first structure elements is different from the design width CD2of the second structure element. By utilizing the difference of the design width, measurement points having overlay errors which are measured improperly can be discriminated.

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