发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS
摘要 <p>Disclosed are: a photosensitive resin composition which is soluble in an aqueous alkaline solution and which has good transmission loss in the visible light range; a cured photosensitive resin product; a photosensitive resin film; a cured photosensitive resin film product; and an optical waveguide produced by using those products. Specifically disclosed are: a photosensitive resin composition which comprises (A) a vinyl polymer having at least one chain-polymerizable functional group per molecule, (B) a polymerizable compound and (C) a polymerization initiator, wherein the component (C) is at least one member selected from the group consisting of oxyphenylacetic acid 2-[oxo-2-phenylacetoxyethoxy]ethyl ester, oxyphenylacetic acid 2-(2-hydroxyethoxy)ethyl ester and oligo[2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]]- propanone; a cured photosensitive resin product; a photosensitive resin film; a cured photosensitive resin film product; and an optical waveguide produced by using those products.</p>
申请公布号 WO2009066638(A1) 申请公布日期 2009.05.28
申请号 WO2008JP70874 申请日期 2008.11.17
申请人 HITACHI CHEMICAL COMPANY, LTD.;SUZUMURA, KOUJI;MAKINO, TATSUYA;TAKAHASHI, ATSUSHI 发明人 SUZUMURA, KOUJI;MAKINO, TATSUYA;TAKAHASHI, ATSUSHI
分类号 G03F7/031;C08F2/50;C08F290/12;G02B6/12;G03F7/004;G03F7/027;G03F7/038 主分类号 G03F7/031
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