| 摘要 |
PROBLEM TO BE SOLVED: To provide a foreign matter inspection apparatus of a semiconductor wafer for accurately detecting a signal by variably controlling a detection circuit characteristic according to a condition of the detected signal. SOLUTION: This foreign matter inspection apparatus for the semiconductor wafer comprises a PMT 103 which detects reflection light, an amplifier 301 which amplifies a signal detected by the PMT 103 and in which response characteristics of amplification are controlled by a control signal, an A/D converter 302 which converts the signal amplified by the amplifier 301 into a predetermined code and outputs the code, a control circuit 303 which generates a control signal based on information of the semiconductor wafer 104 having a correlation with the reflection light, and a data processing circuit which detects a foreign matter on the semiconductor wafer 104 based on the code output from the A/D converter 302. COPYRIGHT: (C)2009,JPO&INPIT |
