发明名称 MgO VAPOR DEPOSITION MATERIAL, MgO FILM AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To improve a vaporizing rate and deposition rate of a MgO vapor deposition material when forming a film with an electron-beam vapor deposition technique. <P>SOLUTION: In a manufacturing method for an MgO vapor deposition material made into a porous sintered compact and whose average pore sizes are set to about 0.1 to 500 &mu;m, a gas is mixed into a slurry containing MgO powder and a solvent, so as to be a raw material, and the raw material is made into a pellet by a sintering process. Alternatively, a foamed material is mixed into a slurry containing MgO powder and a solvent, so as to be a raw material, and the raw material is made into a pellet by a sintering process. Alternatively, an additive generating a gas upon heating is mixed into a slurry containing MgO powder and a solvent, so as to be a raw material, and the raw material is made into a pellet by a sintering process. Alternatively, a powder raw material with a narrow grain size distribution so as to form a gap between the grains is used, and is made into a pellet by a sintering process. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009114541(A) 申请公布日期 2009.05.28
申请号 JP20080318528 申请日期 2008.12.15
申请人 MITSUBISHI MATERIALS CORP 发明人 TOYOGUCHI GINJIRO;SAKURAI HIDEAKI;KUROMITSU YOSHIO
分类号 C23C14/24;C04B35/04;C04B38/02;H01J9/02 主分类号 C23C14/24
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