| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus wherein a chemical is moved on a substrate surface without rotating the substrate itself. SOLUTION: The substrate processing apparatus is provided with a sample stage 1 for placing a substrate 4 to be processed, and an outer ring exhaust rotor 2 arranged on the outer circumference of the sample stage 1. The outer ring exhaust rotor 2 generates a flow in a liquid or a gas existing on the upper surface or the lower surface of the substrate to be processed. COPYRIGHT: (C)2009,JPO&INPIT
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