| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device whose light scanning axis is variable, whose exposure throughput can be improved, and which is miniaturizable. <P>SOLUTION: The exposure device 10 includes a light source 12, a MEMS light scanner for repetitively inclining a mirror M, and an exposure optical system for exposing light from the light source via the mirror onto an object to be exposed. When the light from the light source is scanned with the mirror inclined by the MEMS light scanner and emitted onto the object to be exposed, the mirror M is rotated around an optical axis b of the exposure optical system to expose the light onto the object to be exposed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
