| 摘要 |
PROBLEM TO BE SOLVED: To measure the roughness of a nano scale of the internal interface of a multilayer film formed on a substrate, in an optical and non-destructive/non-contact manner. SOLUTION: A roughness measuring device 100 relating to one embodiment of this invention is designed for measuring the roughness of the measuring object interface between first and second layers formed on the substrate. The device has: a wavelength selecting part 24 which selects the light of an optimal wavelength on which a spectrum of reflection from a multilayer film forming surface of a specimen 30 having the first and second layers formed becomes minimal; a light source 11 which sheds the light of the optimal wavelength on the multilayer film forming surface of the specimen 30 and on a reference surface; a photodetector 22 which receives interference light formed by synthesizing the measuring light reflected on the multilayer film forming surface of the specimen 30 and reference light reflected on the reference surface; and a roughness calculating part 43 which calculates the roughness of the multilayer film forming surface of the specimen from a phase difference between the measuring light and the reference light, based on a change in the intensity of the interference light, and determines the roughness of the measuring object interface, based on the roughness of the multilayer film forming surface. COPYRIGHT: (C)2009,JPO&INPIT
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