METHOD AND DEVICE FOR OBSERVING MULTILAYER FILM STRUCTURE

摘要

PROBLEM TO BE SOLVED: To observe the roughness of a nano scale of the interface of a multilayer film formed on a substrate, in an optical and non-destructive/non-contact manner. SOLUTION: A multilayer film structure observing device 100 relating to one embodiment of this invention is designed for observing an observation object interface of the multilayer film formed on the substrate. The device has: a wavelength selecting part 22 which selects the light of a wavelength on which the reflected light from the interface of the multilayer film other than the observation object interface and the interference light produced by the reflected light cancel each other; and a light source 11 which emits to the multilayer film the light of the wavelength selected by the wavelength selecting part 22. COPYRIGHT: (C)2009,JPO&INPIT