发明名称 Semiconductor device having a filling pattern around a storage structure and method of forming the same
摘要 A semiconductor device includes an interlayer insulating layer on a semiconductor substrate, at least one plug on the semiconductor substrate, the plug extending through the interlayer insulating layer toward an upper portion of the semiconductor substrate, the plug having a lower part with a first diameter and an upper part with a second diameter different from the first diameter, a filling pattern on the interlayer insulating layer, the filling pattern surrounding the upper part of the plug, and an upper surface of the filling pattern being substantially coplanar with an upper surface of the plug, the upper surface of the plug facing away from the semiconductor substrate, and a protection pattern on the upper part of the plug, the protection pattern being between the plug, the filling pattern, and the interlayer insulating layer.
申请公布号 US2009134525(A1) 申请公布日期 2009.05.28
申请号 US20080292673 申请日期 2008.11.24
申请人 MA JONG-WAN;KWON JOON-MO 发明人 MA JONG-WAN;KWON JOON-MO
分类号 H01L23/528 主分类号 H01L23/528
代理机构 代理人
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