发明名称 |
Sb-Te BASE ALLOY SINTER SPUTTERING TARGET |
摘要 |
Provided is an Sb-Te base alloy sinter sputtering target having Sb and Te as its primary component and comprising a structure in which Sb-Te base alloy particles are surrounded by fine carbon or boron particles; wherein, if the mean diameter of the Sb-Te base alloy particles is X and the particle size of carbon or boron is Y, Y/X is within the range of 1/10 to 1/10000. The present invention seeks to improve the Sb-Te base alloy sputtering target structure, inhibit the generation of cracks in the sintered target, and prevent the generation of arcing during the sputtering process. |
申请公布号 |
EP2062994(A1) |
申请公布日期 |
2009.05.27 |
申请号 |
EP20070829288 |
申请日期 |
2007.10.05 |
申请人 |
NIPPON MINING & METALS CO., LTD. |
发明人 |
YAHAGI, MASATAKA;TAKAHASHI, HIDEYUKI;AJIMA, HIROHISA |
分类号 |
C23C14/34;C22C28/00;G11B7/26 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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