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经营范围
发明名称
METHOD OF FORMING DUAL METAL GATE FOR SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100899565(B1)
申请公布日期
2009.05.27
申请号
KR20020064149
申请日期
2002.10.21
申请人
发明人
分类号
H01L27/092
主分类号
H01L27/092
代理机构
代理人
主权项
地址
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