UV decomposable molecules and a photopatternable monomolecular film formed therefrom

摘要

[Problem] The invention provides a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method is attained by using a means ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is UV radiation having a relatively long wavelength. [Means to Solve the Problem] The invention provides monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule comprising the structural component (B) leaving a residual hydrophilic structural component (C). Further, the invention provides a method of forming a film pattern comprising; at least a step of ejecting a droplet, which includes a compound represented as the following Formula (0), on a solid-phase surface having a functional moiety; [Formula 0] X-Y-Z€ƒ€ƒ€ƒ(0) Where, X represents a structure having reactivity to a functional moiety which exists at the solid-phase surface, Y represents a decomposable structure by itself and Z represents a structure which is capable of changing solid-state properties on the solid-phase surface or a reactive structure.