首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
A method for thin film vapor deposition of dialkyl amido dihydro aluminium compound
摘要
申请公布号
EP1788116(B1)
申请公布日期
2009.05.27
申请号
EP20060023815
申请日期
2006.11.16
申请人
UP CHEMICAL CO., LTD.
发明人
SHIN, HYUN KOOCK;KIM, BUM SOO;KIM, JIN SIK;KIM, JUN YOUNG;KIM, YOUNG SEOP;CHO, BO YEARN
分类号
C23C16/20
主分类号
C23C16/20
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Anordning för bestämning av en termisk egenskap hos en vävnad
Ledarm för ledarmstruck
Sätt och tejpremsa för att åstadkomma etsade tecken
Förbättring av de aerodynamiska egenskaperna hos markfordon
Techniques for attaching a label to an electronic cable
Anthranilamides, process for the production thereof, and pest controllers containing the same
Devices and methods for reduction of NOx emissions from lean burn engines
Optical sensor
Methods and systems for redeeming a stored-value card
Method for identifying allergens and other influencing agents that may cause a reaction
Method and apparatus for documenting network paths
Soft error robust static random access memory cells
Electro-optical device, color filter substrate and electronic apparatus
Integrated price management systems with future-pricing and methods therefor
PUFA polyketide synthase systems and uses thereof
PUFA polyketide synthase systems and uses thereof
Hinge
Rutile titania nano sols and process for manufacturing the same
Antenna for plastic window panel
Method and apparatus for remote blood alcohol monitoring
