| 摘要 |
The present invention provides a method of manufacturing color filters using a first mixed gas and a second mixed gas. In the method, a stopper layer whose etching rate by the second mixed gas is low is formed on the support, a colored layer is formed on the stopper layer, a photo resist layer is formed on the colored layer, an image on the colored layer is formed by removing the photo resist layer according to a pattern, a part of the colored layer is removed by dry etching process using the first mixed gas to the extent that the stopper layer is not exposed removing so as to form a colored-layer removed portion according to the pattern, and the colored-layer removed portion is removed by dry etching process using the second mixed gas so as to form a stopper-layer exposed portion according to the pattern.
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