发明名称 Copper interconnection with conductive polymer layer and method of forming the same
摘要 A conductive polymer between two metallic layers acts a glue layer, a barrier layer or an activation seed layer. The conductive polymer layer is employed to encapsulate a copper interconnection structure to prevent copper diffusion into any overlying layers and improve adhesive characteristics between the copper and any overlying layers.
申请公布号 US7538434(B2) 申请公布日期 2009.05.26
申请号 US20050075072 申请日期 2005.03.08
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 SHIH CHIEN-HSUEH;TSAI MINGHSING;SU HUNG-WEN;SHUE SHAU-LIN
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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