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发明名称
METHOD FOR FORMING ISOLATION LAYER OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20090051989(A)
申请公布日期
2009.05.25
申请号
KR20070118480
申请日期
2007.11.20
申请人
HYNIX SEMICONDUCTOR INC.
发明人
JUNG, JONG GOO;KIM, HYUNG HWAN;LEE, HOON
分类号
H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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