发明名称 |
SPUTTERING APPARATUS AND SPUTTERING FILM FORMING METHOD |
摘要 |
<p>Provided is a sputtering apparatus which suppresses entry of thermal electrons into a work and does not cause problems such as work deformation due to heat, even at the time of forming a film on materials, such as plastic, having a low heat resistance. The apparatus is provided with a target and a carousel-type work holder arranged to face the target with a rotating shaft, in a vacuum chamber. The carousel-type work holder has a work holder supporting section and a plurality of work holding sections. The work holding section is arranged at the outer circumfernce of the work holder supporting section. The carousel-type work holder and/or the work holding section is rotatably arranged by a shaft arranged within a surface vertical to a surface connecting the target and the rotating shaft of the carousel-type work holder. Inside the carousel-type work holder, a thermal electron capturing member is arranged.</p> |
申请公布号 |
WO2009063788(A1) |
申请公布日期 |
2009.05.22 |
申请号 |
WO2008JP70177 |
申请日期 |
2008.11.06 |
申请人 |
EBARA-UDYLITE CO., LTD.;HORIE, KUNIAKI;TAKAHASHI, NAOKI |
发明人 |
HORIE, KUNIAKI;TAKAHASHI, NAOKI |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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