发明名称 |
METHOD OF ENABLING SELECTIVE AREA PLATING ON A SUBSTRATE |
摘要 |
A method of enabling selective area plating on a substrate includes forming a first electrically conductive layer (310) over substantially all of the substrate, covering sections of the first electrically conductive layer with a mask (410) such that the first electrically conductive layer has a masked portion and an unmasked portion, forming a second electrically conductive layer (710, 1210), the second electrically conductive layer forming only over the unmasked portion of the first electrically conductive layer, and removing the mask and the masked portion of the first electrically conductive layer. In an embodiment, the mask covering sections of the first electrically conductive layer is a non-electrically conductive substance (1010) applied with a stamp (1020). In an embodiment, the mask is a black oxide layer.
|
申请公布号 |
WO2009042741(A3) |
申请公布日期 |
2009.05.22 |
申请号 |
WO2008US77612 |
申请日期 |
2008.09.25 |
申请人 |
INTEL CORPORATION;BCHIR, OMAR J.;JOMAA, HOUSSAM;SALAMA, ISLAM A.;LI, YONGGANG |
发明人 |
BCHIR, OMAR J.;JOMAA, HOUSSAM;SALAMA, ISLAM A.;LI, YONGGANG |
分类号 |
H01L21/306;H01L21/304 |
主分类号 |
H01L21/306 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|