发明名称 ELECTROLESS/ELECTROLYTIC SEED LAYER PROCESS
摘要 <p>An electroless metallization catalyst layer can be formed in a RFID antenna pattern. A first metallic layer can be deposited over top of the electroless metallization catalyst layer. An electrical short layer connecting regions of the metallic layer can be formed. A portion of electrical short layer can be covered with a non-conductive layer. The first metallic layer can be electroplated with a second metallic layer.</p>
申请公布号 WO2009064598(A1) 申请公布日期 2009.05.22
申请号 WO2008US81013 申请日期 2008.10.23
申请人 RCD TECHNOLOGY INC.;OBERLE, ROBERT, R. 发明人 OBERLE, ROBERT, R.
分类号 C25D5/00 主分类号 C25D5/00
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