| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination apparatus for reducing a fluctuation in illumination, and arbitrarily controlling a characteristic of an aperture, a mask inspecting apparatus using it, a mask inspecting method, and a mask manufacturing method. <P>SOLUTION: The illumination is provided which includes a plurality of laser light sources, an integrator, a beam expanding optical system for causing beams of laser light emitted from a plurality of the laser light sources to enter into the integrator so as to be prevented from being substantially overlapped, and an optical system for collecting the beams of laser light exiting from the integrator. The mask inspecting apparatus using the illumination apparatus. The mask inspecting method and the mask manufacturing method are additionally provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
