发明名称 |
SPUTTERING TARGET USED FOR PRODUCTION OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY |
摘要 |
To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles. A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5 at % to 50 at %.
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申请公布号 |
US2009130574(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20090353284 |
申请日期 |
2009.01.14 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
HAYASHI KAZUYUKI;SUGIYAMA TAKASHI |
分类号 |
C23C14/34;G03F1/22;G03F1/24;H01L21/027 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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