发明名称 ELECTROLESS PLATING METHOD, ELECTROLESS PLATING APPARATUS AND ELECTROMAGNETIC INTERFERENCE SHIELD MATERIAL
摘要 PROBLEM TO BE SOLVED: To increase a plating rate in electroless plating, and to prolong the lifetime of a plating solution. SOLUTION: An electroless plating apparatus 10 comprises an electroless plating tank 16 filled with plating solution 16A, and a current-carrying device 20 which carries the current in a conductive metal pattern 12A consisting of a mesh-like thin wire pattern of a laminate 12 to heat the conductive metal pattern 12A during the electroless plating. The current-carrying device 20 has a power supply roller 22 on a cathode side in contact with the conductive metal pattern 12A of the laminate 12 on an inlet side of the electroless plating tank 16, and a power supply roller 24 on an anode side in contact with the conductive metal pattern 12A of the laminate 12 on an outlet side of the electroless plating tank 16. The conductive metal pattern 12A is conducted by the power supply rollers 22, 24, and a part in a vicinity of the conductive metal pattern 12A is heated in the plating solution. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009108337(A) 申请公布日期 2009.05.21
申请号 JP20070278364 申请日期 2007.10.26
申请人 FUJIFILM CORP 发明人 YAMAZAKI TAKAYASU
分类号 C23C18/18;C23C18/20;C23C18/31;C23C18/40 主分类号 C23C18/18
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