发明名称 |
Apparatus and method for supporting a substrate at a position with high precision |
摘要 |
An apparatus and a method are disclosed for supporting a substrate at a position with high precision. The substrate is placed on a stage which is configured to be traversable in a plane in two spatial directions oriented perpendicular to each other. The substrate is supported on three point-like support elements. At least one of the support elements is configured to be moveable in the plane.
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申请公布号 |
US2009126525(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20080286465 |
申请日期 |
2008.09.30 |
申请人 |
VISTEC SEMICONDUCTOR SYSTEMS GMBH |
发明人 |
PIETSCH KATRIN;ADAM KLAUS-DIETER;EHRENBERG TILLMANN |
分类号 |
G12B5/00;B65G49/07;G05G11/00 |
主分类号 |
G12B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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